Research Scientist in Metrology for Thin-Film Characterization and Optical Material Properties (m/f/x)
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What you'll do
- Develop innovative measurement methods for characterizing optical thin-film systems and material properties for semiconductor lithography as part of an interdisciplinary team
- Understand the underlying physical principles, interpret complex measurement data and derive innovative metrology solutions
- Design, validate and transfer new measurement techniques for determining material and thin-film properties into manufacturing
- Provide technical support for existing thin-film metrology systems and measurement processes and continuously enhance them
- Coordinate requirements with internal specialist departments and external partners and successfully implement metrology solutions
What they're looking for
- An excellent university degree in physics, materials science or a comparable natural science discipline, preferably with a PhD
- In-depth knowledge of physical metrology and materials characterization as well as an interest in optical and X-ray-based measurement methods
- Experience in the development, specification or evaluation of complex measurement systems
- Good programming skills in MATLAB and/or Python and a strong interest in analyzing complex measurement data
- A structured and independent approach to work, a collaborative mindset and the ability to develop creative solutions
- Strong communication skills in both German and English
Nice to have
- Knowledge of X-ray metrology, materials characterization, spectroscopy or comparable physical measurement methods would be an advantage
Summarised by NextRaise from the employer’s description, which follows in full below.
Full description from employer
Enabling smaller, more powerful and energy-efficient microchips – working where tomorrow takes shape.
Around 80 percent of all microchips worldwide are manufactured using ZEISS technologies. As the heart of every electronically controlled system, they have become an indispensable part of our everyday lives – whether in smartphones, smart homes or smart factories.
ZEISS is a technology leader in semiconductor manufacturing equipment. With highly precise lithography optics, photomask systems and process control solutions, ZEISS enables the production of ever smaller, more powerful and more energy-efficient microchips – and, through its innovations, plays a key role in shaping the age of micro- and nanoelectronics.
Your Role
You will:
- Develop innovative measurement methods for characterizing optical thin-film systems and material properties for semiconductor lithography as part of an interdisciplinary team
- Understand the underlying physical principles, interpret complex measurement data and derive innovative metrology solutions
- Design, validate and transfer new measurement techniques for determining material and thin-film properties into manufacturing
- Provide technical support for existing thin-film metrology systems and measurement processes and continuously enhance them
- Coordinate requirements with internal specialist departments and external partners and successfully implement metrology solutions
Your Profile
You have:
- An excellent university degree in physics, materials science or a comparable natural science discipline, preferably with a PhD
- In-depth knowledge of physical metrology and materials characterization as well as an interest in optical and X-ray-based measurement methods
- Experience in the development, specification or evaluation of complex measurement systems
- Knowledge of X-ray metrology, materials characterization, spectroscopy or comparable physical measurement methods would be an advantage
- Good programming skills in MATLAB and/or Python and a strong interest in analyzing complex measurement data
- A structured and independent approach to work, a collaborative mindset and the ability to develop creative solutions
- Strong communication skills in both German and English
Your ZEISS Recruiting Team:
Jonas WeickenmeierCompany
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